Application of carbon as a barrier layer in Sc/Si multilayer X-ray mirrors

Abstract

X-ray reflectometry in the hard X-ray region (λ = 0.154 nm) was used to investigate the barrier properties of carbon layers 0.2-1.3 nm thick in Sc/Si multilayer X-ray mirrors (MXMs) deposited by DC magnetron sputtering. Precise measurement of the MXM period makes it possible to record volumetric changes in the Sc/C/Si MXM with an accuracy better than 0.01 nm, thus the interaction of the carbon layers with the material of the matrix layers was revealed. The formation of carbide (Si-on-Sc interface) and carbide-silicide (Sc-on-Si nterface) layers was found. The reflectivity of the Sc/C/Si mirrors at the wavelength of ~ 46.9 nm was estimated.