Recording of high efficiency diffraction gratings by He-Ne laser

Abstract

The investigation results of holographic diffraction gratings recording processes by radiation of helium-neon laser have been represented. Inorganic As₄₀S₂₀Se₄₀ photoresist treated by the newly developed selective etching solution was chosen as a registering media. Angular and spectral dependencies of grating diffractive efficiency absolute values were measured. A comparison of fabricated gratings characteristics with corresponding parameters of gratings recorded on As₄₀Se₆₀ photoresist was carried out. Numericall simulation of groove profiles inherent to holographic gratings made in various experimental conditions was performed. Shown is that photoresists based on As₄₀S₂₀Se₄₀ are suitable for production of high quality holographic optical elements.