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<title>Functional Materials, 2018, № 3</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/150317</link>
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<pubDate>Sat, 18 Apr 2026 12:14:38 GMT</pubDate>
<dc:date>2026-04-18T12:14:38Z</dc:date>
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<title>Functional Materials, 2018, № 3</title>
<url>http://dspace.nbuv.gov.ua:80/bitstream/id/448064/</url>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/150317</link>
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<title>Boron removal from metallurgical grade silicon and Si-Sn alloy through slag refining with gas blowing</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/157193</link>
<description>Boron removal from metallurgical grade silicon and Si-Sn alloy through slag refining with gas blowing
Rowaid Al-khazraji; Yaqiong Li; Lifeng Zhang
A combined method of slag refining and gas blowing technique were used for boron removal from metallurgical grade silicon and 75%wt Si-Sn alloy using the 45%CaO-45%SiO₂-10%CaCl₂ slag with the use of Ar gas and Ar-20%O₂ mixed gas. Increasing gas flow rate from 50 to 250 ml/min shows enhancement in B removal. At fixed conditions the Ar-20%O₂ mixed gas blowing shows a good removal efficiency of boron about 85% and 96% to MG and Si-Sn alloy respectively, compared with the single Ar gas blowing with 78.6% and 88% to MG and Si-Sn alloy respectively. Changes in slag composition representing by decreasing in all compounds especially CaCl₂ attached with increase in Al₂O₃. The B impurities after the treatment found with low intensity in Si matrix but with high intensity in slag phase and Sn phase. Boron removal controlled by mass transfer in slag phase with mass transfer coefficients of 3.38ċ10⁻⁴cm.s⁻¹ and 7.2ċ10⁻⁵cm.s⁻¹ in Si and Si-Sn alloy respectively.
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<pubDate>Mon, 01 Jan 2018 00:00:00 GMT</pubDate>
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<dc:date>2018-01-01T00:00:00Z</dc:date>
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<title>Corrosion resistance and protective properties of chromium coatings electrodeposited from an electrolyte based on deep eutectic solvent</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/157192</link>
<description>Corrosion resistance and protective properties of chromium coatings electrodeposited from an electrolyte based on deep eutectic solvent
Protsenko, V.S.; Bobrova, L.S.; Korniy, S.A.; Kityk, A.A.; Danilov, F.I.
The paper deals with the corrosion resistance and protective properties of chromium coatings electrodeposited from an electrolyte based on deep eutectic solvent, a new generation of ionic liquids. The electroplating bath contained chromium (III) chloride, choline chloride and some extra water. Chromium layers with a thickness of 2.5, 5, 10, 15 and 20 μm were deposited on mild steel samples and their corrosion and electrochemical behavior was determined by voltammetry method and electrochemical impedance spectroscopy technique. It was stated that the highest resistance to corrosion damage of the Cr layer and mild steel substrate is achieved when the thickness of deposit is about 5 μm. At smaller or greater thickness, the chromium electrodeposits become more defective, and a larger number of microcracks and micropores appear; as a result, the corrosion stability and protective characteristics diminish.
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<pubDate>Mon, 01 Jan 2018 00:00:00 GMT</pubDate>
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<dc:date>2018-01-01T00:00:00Z</dc:date>
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<title>Crystallization of the fusible component in Ag/Bi/Ag and Ag/Pb/Ag layered film systems</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/157184</link>
<description>Crystallization of the fusible component in Ag/Bi/Ag and Ag/Pb/Ag layered film systems
Dukarov, S.V.; Petrushenko, S.I.; Sukhov, V.N.; Sukhov, R.V.
The results of studies of the supercooling during the crystallization of a fusible component in Ag/Bi/Ag and Ag/Pb/Ag layered film systems are presented. The crystallization temperatures of metastable melts are determined by using two independent in situ techniques. The value of supercooling and the character of crystallization in Ag/Bi/Ag samples is determined by the condensation mechanism during the bismuth deposition (vapor-crystal or vapor-liquid). This phenomenon is explained by differences in the morphological structure of the films.
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<pubDate>Mon, 01 Jan 2018 00:00:00 GMT</pubDate>
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<dc:date>2018-01-01T00:00:00Z</dc:date>
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<title>On the features of crystallization methods used for the purification of aqueous solutions of cesium iodide</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/157183</link>
<description>On the features of crystallization methods used for the purification of aqueous solutions of cesium iodide
Cherginets, V.L.; Ponomarenko, T.V.; Rebrova, T.P.; Varich, A.G.; Rebrov, A.L.; Datsko, Yu.N.
Comparative analysis of CsI purification methods: mass crystallization with natural cooling (MC), low-temperature directed crystallization without stirring (LTDC/ws) and low-temperature mixed crystallization (LTMC) is presented. The MC routine possesses the highest cooling rate (6-10°C/h) and the smallest effective purification coefficients (β = 0.07-0.2) from Na, K and Rb, however the yield of the product per stage is only 60 %. The low-temperature methods are characterized by low cooling rate of ~1°C/h and higher yields of the purified product per stage (95-97 %) and β values closer to 1 than those for MC; the purification occurs especially hardly in the case of LTDC/ws (β ~ 0.9).The mentioned crystallization methods do not provide the removal of Tl which is accumulated in the product. With respect to efficiency of the purification 1 stage of MC is equivalent to 3-4 stages of LTMC or 10-11 stages of LTDC/ws and the yield of the product (CsI) is 60 %, 85-90 % and 55-70 %, respectively. The LTMC method seems the most promising for the obtaining of extra pure CsI of enhanced quality due to low enough values of β for Na, K and Rb (β = 0.46-0.6) and considerably smaller than in the case of MC rate of cooling (a degree of overcooling).
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<pubDate>Mon, 01 Jan 2018 00:00:00 GMT</pubDate>
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<dc:date>2018-01-01T00:00:00Z</dc:date>
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