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<title>Semiconductor Physics Quantum Electronics &amp; Optoelectronics, 2013, том 16</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/114449</link>
<description/>
<pubDate>Mon, 06 Apr 2026 23:32:57 GMT</pubDate>
<dc:date>2026-04-06T23:32:57Z</dc:date>
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<title>Semiconductor Physics Quantum Electronics &amp; Optoelectronics, 2013, том 16</title>
<url>http://dspace.nbuv.gov.ua:80/bitstream/id/340887/</url>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/114449</link>
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<item>
<title>Studying anisotropic properties of longitudinal inhomogeneous nondepolarizing media with elliptical phase anisotropy</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117821</link>
<description>Studying anisotropic properties of longitudinal inhomogeneous nondepolarizing media with elliptical phase anisotropy
Kolomiets, I.S.; Savenkov, S.N.; Oberemok, Ye.A.; Klimov, A.S.
In this paper, basing on the anisotropic properties of longitudinal&#13;
inhomogeneous nondepolarizing media with linear phase anisotropy, more general type&#13;
of media with elliptical phase anisotropy was studied. The features of propagation of&#13;
light with privileged states of polarization were observed. Transformation of polarization&#13;
states of eigenwaves along z axes of light propagation was studied. The orthogonalization&#13;
properties inherent to this type of medium were obtained. Evolution of linear polarized&#13;
light in this media was presented and discussed.
</description>
<pubDate>Tue, 01 Jan 2013 00:00:00 GMT</pubDate>
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<dc:date>2013-01-01T00:00:00Z</dc:date>
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<item>
<title>Is there any future of optical discs?</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117820</link>
<description>Is there any future of optical discs?
Kryuchyn, A.A.; Petrov, V.V.; Kostyukevych, S.O.; Kostyukevych, K.V.; Kudryavtsev, A.A.; Moskalenko, N.L.
Considered in this paper are causes for cutting compact discs out of&#13;
information technology market. It has been shown a search of new technological&#13;
solutions for efficient use of CDs in archive data storage.
</description>
<pubDate>Tue, 01 Jan 2013 00:00:00 GMT</pubDate>
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<dc:date>2013-01-01T00:00:00Z</dc:date>
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<item>
<title>Tin doping effect on crystallization of amorphous silicon obtained by vapor deposition in vacuum</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117819</link>
<description>Tin doping effect on crystallization of amorphous silicon obtained by vapor deposition in vacuum
Neimash, V.B.; Poroshin, V.M.; Shepeliavyi, P.Ye.; Yukhymchuk, V.O.; Melnyk, V.V.; Makara, M.A.; Kuzmich, A.G.
The influence of tin impurity on amorphous silicon crystallization was&#13;
investigated using the methods of Raman scattering, Auger spectroscopy at ion etching,&#13;
scanning electron microscopy and X-ray fluorescence microanalysis in thin films of&#13;
Si:Sn alloy manufactured by thermal evaporation. Formation of Si crystals of the 2 to 4-&#13;
nm size has been found in the amorphous matrix alloy formed at the temperature 300 C.&#13;
Total volume of nanocrystals correlates with the content of tin and can comprise as much&#13;
as 80% of the film. The effect of tin-induced crystallization of amorphous silicon&#13;
occurred only if there are clusters of metallic tin in the amorphous matrix. The&#13;
mechanism of tin-induced crystallization of silicon that has been proposed takes into&#13;
account the processes in eutectic layer at the interface metal tin – amorphous silicon.
</description>
<pubDate>Tue, 01 Jan 2013 00:00:00 GMT</pubDate>
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<dc:date>2013-01-01T00:00:00Z</dc:date>
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<title>Graphene layers fabricated from the Ni/a-SiC bilayer precursor</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117818</link>
<description>Graphene layers fabricated from the Ni/a-SiC bilayer precursor
Nazarov, A.N.; Vasin, A.V.; Gordienko, S.O.; Lytvyn, P.M.; Strelchuk, V.V.; Nikolenko, A.S.; Stubrov, Yu.Yu.; Hirov, A.S.; Rusavsky, A.V.; Popov, V.P.; Lysenko, V.S.
This paper considers a synthesis of graphene flakes on the Ni surface by&#13;
vacuum long and nitrogen rapid thermal treatment of the “sandwich” amorphous (a)&#13;
SiC/Ni multilayer deposited on silicon wafer by magnetron sputtering technique. The&#13;
lateral size of graphene flakes was estimated to be about hundreds of micrometers while&#13;
the thickness estimated using Raman scattering varied from one to few layers in case of&#13;
vacuum annealing. Rapid thermal annealing (RTA) in nitrogen ambient results in&#13;
formation of multilayer graphene with surface covering up to 80%. The graphene layers&#13;
synthesized on Ni during CVD process was used as reference samples. Atomic force&#13;
microscopy (AFM) is not able to detect graphene flakes in regime of surface topology&#13;
examination because of large roughness of Ni surface. Employment of scanning Kelvin&#13;
probe force microscopy (SKPFM) demonstrates correlation of the surface potential and&#13;
graphene flakes visible in optical microscopy. Using the KPFM method, potential&#13;
differences between Ni and graphene were determined.
</description>
<pubDate>Tue, 01 Jan 2013 00:00:00 GMT</pubDate>
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<dc:date>2013-01-01T00:00:00Z</dc:date>
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