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<title>Вопросы атомной науки и техники, 2002, № 4</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/74816</link>
<description/>
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<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/80328"/>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/80327"/>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/80326"/>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/80325"/>
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<dc:date>2026-04-05T16:37:03Z</dc:date>
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<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/80328">
<title>Application of pulsed plasma streams for materials alloying and coatings modification</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/80328</link>
<description>Application of pulsed plasma streams for materials alloying and coatings modification
Byrka, O.V.; Bandura, A.N.; Chebotarev, V.V.; Garkusha, I.E.; Langner, J.; Sadowski, M.J.; Tereshin, V.I.
Results of pulsed plasma streams processing of material surfaces with previously deposited FeB and TiAlN coatings are presented. Under the plasma treatment intensive mixing the materials of coating with the material of substrate was achieved. In the first case this provided boronizing of the modified layer with aim of corrosion properties improvement, in the second case – formation of intermediate mixed layer for subsequent deposition of the hard alloyed coatings. Materials alloying with pulsed metal-gas plasma is discussed also.
</description>
<dc:date>2002-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/80327">
<title>Ion kinetics in an ECR plasma source</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/80327</link>
<description>Ion kinetics in an ECR plasma source
Gutiérrez-Tapia, C.
In plasma reactors it is extremely important the study for achieving greater control of critical parameters such as the flux velocities and the energy distribution of ions. These quantities are functions of the reactor physical dimensions, magnetic field profile as well as the kinetic chemical reactions occurring in the discharge. In this work, a model previously reported in [1] is improved. In that model using the drift kinetic equation approach the axial and radial ion fluxes at processing zone of an ECR plasma source are calculated. Now, the ionization rates are calculated from the energy distribution function obtained by a regularization method and using the experimental data of the electric probe measurements. Also, a more exact calculation of the external magnetic field is included.
</description>
<dc:date>2002-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/80326">
<title>Dusty discharges with secondary electron emission</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/80326</link>
<description>Dusty discharges with secondary electron emission
Chutov, Yu. I.; Goedheer, W.J.; Kravchenko, O.Yu.; Lavrov, O.A.; Romanenko, R.
</description>
<dc:date>2002-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/80325">
<title>Critical energy in the cyclotron heating of ions in an ECR plasma source</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/80325</link>
<description>Critical energy in the cyclotron heating of ions in an ECR plasma source
Gutiérrez-Tapia, C.; Hernández-Aguirre, O.
The problem of plasma cyclotron heating in ECR plasma sources, to sustain the discharge, remains important at present. There are two methods for the analysis of this problem. The first one is the one particle stochastic mechanism and the second one is related with the non-linear interaction of waves where the collective behaviour of particles becomes the most important. In this work, in the Hamilton formalism, the stochastic mechanism of the cyclotron heating is analyzed. It is considered the case of an ECR plasma source where a TE11 electromagnetic wave is applied. The critical energy for the resonance mixing is calculated an by the “section-of-surface” method the inhomogeneity of the external magnetic field is analyzed.
</description>
<dc:date>2002-01-01T00:00:00Z</dc:date>
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