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<title>Semicond. Physics Quantum Electronics &amp; Optoelectronics, 2005, № 1</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/114597</link>
<description/>
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<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/121862"/>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/121252"/>
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<dc:date>2026-04-25T16:54:17Z</dc:date>
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<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/121863">
<title>Review of monograph</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/121863</link>
<description>Review of monograph
Svechnikov, S.V.
Review of monograph: A.A. Akopyan, O. Yu. Borkovskaya, N.L. Dmitruk, A.V. Karimov, R.V. Konakova, V.V. Melenin, A.V. Sachenko, M.N. Tursunov, D.M. Yodgorova.  "Photoconverters with AlGaAs/GaAs Heterojunction on Textured GaAs Substrates (Physico-Technological aspects) -Fan Publishers, Tashkent, 2004
</description>
<dc:date>2005-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/121862">
<title>Growing the high-resistive Cd₁₋xZnxTe single crystals from a vapor phase</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/121862</link>
<description>Growing the high-resistive Cd₁₋xZnxTe single crystals from a vapor phase
Feychuk, P.; Kopyl, O.; Pavlovich, I.; Shcherbak, L.
A modified vapor phase growth method to obtain high-resistive Cd1-xZnxTe&#13;
 single crystals (0 &lt; x &lt; 0.13) is presented. The single crystals (about 25 cm⁻³ in size)&#13;
 with natural faceting were grown by vapor transport in silica ampoules with a special&#13;
 shape using a polycrystalline ingot as initial source material. It is shown that&#13;
 minimization of plastic deformation effect in preparation of the most structurally&#13;
 perfect crystals is possible by a way of heat removal from the crystallization front by&#13;
 radiation. The growth of high-resistive material required careful preparation of the&#13;
 initial charge with close to stoichiometric composition. The obtained crystals were&#13;
 successfully tested for creating the room temperature X-ray and gamma-ray detectors.
</description>
<dc:date>2005-01-01T00:00:00Z</dc:date>
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<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/121252">
<title>Quadric hologram-based self-conjugation of vortex beams</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/121252</link>
<description>Quadric hologram-based self-conjugation of vortex beams
Polyanskii, P.V.; Felde, Ch.V.
Self-conjugation of singular (vortex) beams by a static nonlinearly recorded hologram is reported. Diagnostics of phase-conjugated vortices is implemented using an original technique based on Young’s model of diffraction phenomena. It has been shown that the phase-conjugated vortex is characterized by the same topological charge as the vortex reversed through four-wave degenerate mixing being different in sign from the vortex reflected by a common mirror.
</description>
<dc:date>2005-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/120651">
<title>Modification of electroluminescence and charge trapping in germanium implanted metal-oxide-silicon light-emitting diodes with plasma treatment</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/120651</link>
<description>Modification of electroluminescence and charge trapping in germanium implanted metal-oxide-silicon light-emitting diodes with plasma treatment
Nazarov, A.N.; Skorupa, W.; Vovk, Ja.N.; Osiyuk, I.N.; Tkachenko, A.S.; Tyagulskii, I.P.; Lysenko, V.S.; Gebel, T.; Rebohle, L.; Yankov, R.A.; Nazarova, T.M.
We have studied the effect of plasma treatment on both the electroluminescent (EL) properties of Ge-implanted light-emitting metal-oxide silicon (MOS) devices and the charge trapping processes occurring therein. Under optimum conditions of plasma treatment, an appreciable increase in the device lifetime has been observed while maintaining the intensity of the light emission unchanged in the violet range of the spectrum. These phenomena are believed to be associated with recovery of the oxide network resulting from a relief of internal mechanical stresses and bond rearrangement that leads to a decrease in the generation efficiency of electron traps which are responsible for the device degradation.
</description>
<dc:date>2005-01-01T00:00:00Z</dc:date>
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