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<title>Semicond. Physics Quantum Electronics &amp; Optoelectronics, 2013, № 1</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/114450</link>
<description/>
<items>
<rdf:Seq>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/117671"/>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/117670"/>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/117669"/>
<rdf:li rdf:resource="http://dspace.nbuv.gov.ua:80/handle/123456789/117668"/>
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</items>
<dc:date>2026-04-20T19:01:54Z</dc:date>
</channel>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/117671">
<title>The influence of temperature on optical properties of merocyanine dye thin films</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117671</link>
<description>The influence of temperature on optical properties of merocyanine dye thin films
Sieryk, M.M.; Doroshenko, T.P.; Grytsenko, K.P.; Navozenko, O.M.; Tolmachev, O.I.; Slominski, Yu.L.; Schrader, S.
Merocyanine dye thin films have been investigated using optical microscopy&#13;
methods. The films were deposited using the method of thermal evaporation. The&#13;
influence of substrate type and temperature on optical properties and spatial orientation&#13;
of molecules in the above films has been studied. The influence of annealing on&#13;
structural reorientation of molecules in thermally deposited dye films has been&#13;
determined.
</description>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/117670">
<title>Laser heating effect on Raman spectra of Si nanocrystals embedded into SiOx matrix</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117670</link>
<description>Laser heating effect on Raman spectra of Si nanocrystals embedded into SiOx matrix
Nikolenko, A.S.
Influence of combined size confinement effect and effect of local laser heating&#13;
 on the first-order Raman spectrum of silicon nanocrystals embedded into SiOx matrix has&#13;
 been studied. Increase of the local temperature of Si nanocrystals caused by laser&#13;
 illumination with the power density up to 10 mW/μm² was estimated from the ratio of&#13;
 the Stokes/anti-Stokes peak intensities. Almost linear dependence of nanocrystals local&#13;
 temperature on the power density of exciting radiation with a rate of 63.6 Km² /mW has&#13;
 been found. The phonon line shape at power densities, when no laser heating effect is&#13;
 registered, was shown to be described well within the correlation length model of phonon&#13;
 confinement of Si nanocrystals with the size L = 9.2 nm. Observed phonon softening and&#13;
 broadening with increase of the exciting power density is considered as temperatureinduced vibration anharmonicity with the decay of optical phonons through three and four-phonon processes and corresponding anharmonic constants have been determined.
</description>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/117669">
<title>A subharmonic mixer for the 220–325 GHz frequency range</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117669</link>
<description>A subharmonic mixer for the 220–325 GHz frequency range
Zorenko, A.V.; Kolesnik, N.V.; Kritskaya, T.V.; Kudryk, Ya.Ya.; Marunenko, Yu.V.; Ryzhanovich, L.P.
We have made a subharmonic mixer (SHM) for the 220–325 GHz frequency&#13;
 range with conversion losses lower than 30 dB at the intermediate frequency 3 GHz. The&#13;
 subharmonic mixer design was based on a GaAs mixer Schottky barrier diode with beam  leads on a quartz 25-μm thick microwave board. The microwave board was placed in a&#13;
 package with a waveguide channel of local oscillator input (cross-sectional area&#13;
 1.2×2.4 mm) and waveguide channel of signal input (cross-sectional area 0.4×0.8 mm²&#13;
 ). The IF signal goes out through a subminiature A-connector, wave impedance of which is  50 Ohm.
</description>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</item>
<item rdf:about="http://dspace.nbuv.gov.ua:80/handle/123456789/117668">
<title>Features of piezoresistance in heavily doped n-silicon crystals</title>
<link>http://dspace.nbuv.gov.ua:80/handle/123456789/117668</link>
<description>Features of piezoresistance in heavily doped n-silicon crystals
Gaidar, G.P.
It has been shown that in silicon single crystals heavily doped with arsenic the&#13;
 presence of the temperature gradient at the interface of the liquid and solid phases in the&#13;
 process of growing them from a melt does not lead to anisotropy of piezoresistance under  the passing current both along the direction of deforming load (J || X || 111) and&#13;
 perpendicularly to it (J ⊥ X || 111). This is considered as an evidence of the dominant&#13;
 influence of randomization in spatial distribution of a dopant due to kT (at T = 1685 K)&#13;
 during the growth of single crystals.
</description>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</item>
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