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<title>Semiconductor Physics Quantum Electronics &amp; Optoelectronics, 2006, том 9</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/114591" rel="alternate"/>
<subtitle/>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/114591</id>
<updated>2026-04-06T11:13:42Z</updated>
<dc:date>2026-04-06T11:13:42Z</dc:date>
<entry>
<title>Surface microrelief obtained by composed target deposition for LC molecules alignment</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/121643" rel="alternate"/>
<author>
<name>Kolomzarov, Yu.</name>
</author>
<author>
<name>Oleksenko, P.</name>
</author>
<author>
<name>Sorokin, V.</name>
</author>
<author>
<name>Tytarenko, P.</name>
</author>
<author>
<name>Zelinskyy, R.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/121643</id>
<updated>2017-06-16T00:04:04Z</updated>
<published>2006-01-01T00:00:00Z</published>
<summary type="text">Surface microrelief obtained by composed target deposition for LC molecules alignment
Kolomzarov, Yu.; Oleksenko, P.; Sorokin, V.; Tytarenko, P.; Zelinskyy, R.
Technology of SiOx:In,Sn aligning films deposited by the cathode reactive sputtering (CRS) method is presented. The influence of In, Sn alloy surface concentration in Si cathode target on aligning film properties are investigated by the AFM and optical profilometry methods. The properties of aligning microrelief obtained by CRS method for various In, Sn concentration and by the polyimide rubbing method are compared. It was shown that such aligning microrelief can create defectless and perfect at the microscopic level nematic LC oriented structures.
</summary>
<dc:date>2006-01-01T00:00:00Z</dc:date>
</entry>
<entry>
<title>Kinoform syntesis as an improved method to form a concealed image in optical security devices</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/121642" rel="alternate"/>
<author>
<name>Braginets, E.V.</name>
</author>
<author>
<name>Girnyk, V.I.</name>
</author>
<author>
<name>Kostyukevych, S.A.</name>
</author>
<author>
<name>Kurashov, V.N.</name>
</author>
<author>
<name>Soroka, A.A.</name>
</author>
<author>
<name>Moskalenko, N.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/121642</id>
<updated>2017-06-16T00:03:06Z</updated>
<published>2006-01-01T00:00:00Z</published>
<summary type="text">Kinoform syntesis as an improved method to form a concealed image in optical security devices
Braginets, E.V.; Girnyk, V.I.; Kostyukevych, S.A.; Kurashov, V.N.; Soroka, A.A.; Moskalenko, N.
It is well known that one of the basic functions of security holograms is the maximal complication of their non-authorized reproduction, in other words – counterfeiting. To solve the problem, concealed images that can be observed only under special conditions are placed into a structure of the hologram. A popular way to place concealed image in Diffractive Optically Variable Image Device (DOVID) is integration into DOVID's structure of a Concealed Laser-Readable Image (CLRI). Traditionally CLRI is a 2D Computer-Generated Hologram (2D CGH), which is a digitized Interference Fringe Data (IFD) structure, computed under the scheme of Fourier-hologram synthesis. Such hologram provides inspection of the second level with portable laser reading devices. While it is being read, two (+/– 1 order of diffraction) identical images are formed. It is very interesting to achieve a CGH, which restores the image only in one diffractive order or two different images in +1 and –1 orders of diffraction.
</summary>
<dc:date>2006-01-01T00:00:00Z</dc:date>
</entry>
<entry>
<title>Modelling vacancy microvoid formation in dislocation-free silicon single crystals</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/121641" rel="alternate"/>
<author>
<name>Talanin, V.I.</name>
</author>
<author>
<name>Talanin, I.E.</name>
</author>
<author>
<name>Koryagin, S.A.</name>
</author>
<author>
<name>Semikina, M.Yu.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/121641</id>
<updated>2017-06-16T00:03:27Z</updated>
<published>2006-01-01T00:00:00Z</published>
<summary type="text">Modelling vacancy microvoid formation in dislocation-free silicon single crystals
Talanin, V.I.; Talanin, I.E.; Koryagin, S.A.; Semikina, M.Yu.
An alternative mathematical model of vacancy microvoid formation in dislocation-free silicon single crystals was represented. The analysis of conditions of microvoid nucleation inside the bulk of crystals during cooling after their growth was carried out. The possibility of formation of a quasi-stationary microvoid profile in large-scale crystals within the temperature range 1130…1070 °С has been shown.
</summary>
<dc:date>2006-01-01T00:00:00Z</dc:date>
</entry>
<entry>
<title>Electric properties of TlInS₂ single crystals</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/121640" rel="alternate"/>
<author>
<name>Mustafaeva, S.N.</name>
</author>
<author>
<name>Ismailov, A.A.</name>
</author>
<author>
<name>Akhmedzade, N.D.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/121640</id>
<updated>2017-06-16T00:03:38Z</updated>
<published>2006-01-01T00:00:00Z</published>
<summary type="text">Electric properties of TlInS₂ single crystals
Mustafaeva, S.N.; Ismailov, A.A.; Akhmedzade, N.D.
Injection currents are studied in high-resistive layer of TlInS2 single crystals and the following parameters were determined: equilibrium concentration of charge carriers in the allowed band p0 = 1.67⋅10¹⁰ cm⁻³; concentration of traps Nt = 10¹²cm⁻³; capture factor θ = 0.17; mobility of charge carriers μ = 3.3⋅10⁻³cm²/V⋅s; the depth of trap level responsible for the injection current Et = 0.44 eV.
</summary>
<dc:date>2006-01-01T00:00:00Z</dc:date>
</entry>
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