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<title>Semiconductor Physics Quantum Electronics &amp; Optoelectronics, 2013, том 16</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/114449" rel="alternate"/>
<subtitle/>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/114449</id>
<updated>2026-04-06T22:02:33Z</updated>
<dc:date>2026-04-06T22:02:33Z</dc:date>
<entry>
<title>Studying anisotropic properties of longitudinal inhomogeneous nondepolarizing media with elliptical phase anisotropy</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/117821" rel="alternate"/>
<author>
<name>Kolomiets, I.S.</name>
</author>
<author>
<name>Savenkov, S.N.</name>
</author>
<author>
<name>Oberemok, Ye.A.</name>
</author>
<author>
<name>Klimov, A.S.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/117821</id>
<updated>2017-05-27T00:04:37Z</updated>
<published>2013-01-01T00:00:00Z</published>
<summary type="text">Studying anisotropic properties of longitudinal inhomogeneous nondepolarizing media with elliptical phase anisotropy
Kolomiets, I.S.; Savenkov, S.N.; Oberemok, Ye.A.; Klimov, A.S.
In this paper, basing on the anisotropic properties of longitudinal&#13;
inhomogeneous nondepolarizing media with linear phase anisotropy, more general type&#13;
of media with elliptical phase anisotropy was studied. The features of propagation of&#13;
light with privileged states of polarization were observed. Transformation of polarization&#13;
states of eigenwaves along z axes of light propagation was studied. The orthogonalization&#13;
properties inherent to this type of medium were obtained. Evolution of linear polarized&#13;
light in this media was presented and discussed.
</summary>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</entry>
<entry>
<title>Is there any future of optical discs?</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/117820" rel="alternate"/>
<author>
<name>Kryuchyn, A.A.</name>
</author>
<author>
<name>Petrov, V.V.</name>
</author>
<author>
<name>Kostyukevych, S.O.</name>
</author>
<author>
<name>Kostyukevych, K.V.</name>
</author>
<author>
<name>Kudryavtsev, A.A.</name>
</author>
<author>
<name>Moskalenko, N.L.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/117820</id>
<updated>2017-05-27T00:04:44Z</updated>
<published>2013-01-01T00:00:00Z</published>
<summary type="text">Is there any future of optical discs?
Kryuchyn, A.A.; Petrov, V.V.; Kostyukevych, S.O.; Kostyukevych, K.V.; Kudryavtsev, A.A.; Moskalenko, N.L.
Considered in this paper are causes for cutting compact discs out of&#13;
information technology market. It has been shown a search of new technological&#13;
solutions for efficient use of CDs in archive data storage.
</summary>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</entry>
<entry>
<title>Tin doping effect on crystallization of amorphous silicon obtained by vapor deposition in vacuum</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/117819" rel="alternate"/>
<author>
<name>Neimash, V.B.</name>
</author>
<author>
<name>Poroshin, V.M.</name>
</author>
<author>
<name>Shepeliavyi, P.Ye.</name>
</author>
<author>
<name>Yukhymchuk, V.O.</name>
</author>
<author>
<name>Melnyk, V.V.</name>
</author>
<author>
<name>Makara, M.A.</name>
</author>
<author>
<name>Kuzmich, A.G.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/117819</id>
<updated>2017-05-27T00:04:24Z</updated>
<published>2013-01-01T00:00:00Z</published>
<summary type="text">Tin doping effect on crystallization of amorphous silicon obtained by vapor deposition in vacuum
Neimash, V.B.; Poroshin, V.M.; Shepeliavyi, P.Ye.; Yukhymchuk, V.O.; Melnyk, V.V.; Makara, M.A.; Kuzmich, A.G.
The influence of tin impurity on amorphous silicon crystallization was&#13;
investigated using the methods of Raman scattering, Auger spectroscopy at ion etching,&#13;
scanning electron microscopy and X-ray fluorescence microanalysis in thin films of&#13;
Si:Sn alloy manufactured by thermal evaporation. Formation of Si crystals of the 2 to 4-&#13;
nm size has been found in the amorphous matrix alloy formed at the temperature 300 C.&#13;
Total volume of nanocrystals correlates with the content of tin and can comprise as much&#13;
as 80% of the film. The effect of tin-induced crystallization of amorphous silicon&#13;
occurred only if there are clusters of metallic tin in the amorphous matrix. The&#13;
mechanism of tin-induced crystallization of silicon that has been proposed takes into&#13;
account the processes in eutectic layer at the interface metal tin – amorphous silicon.
</summary>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</entry>
<entry>
<title>Graphene layers fabricated from the Ni/a-SiC bilayer precursor</title>
<link href="http://dspace.nbuv.gov.ua:80/handle/123456789/117818" rel="alternate"/>
<author>
<name>Nazarov, A.N.</name>
</author>
<author>
<name>Vasin, A.V.</name>
</author>
<author>
<name>Gordienko, S.O.</name>
</author>
<author>
<name>Lytvyn, P.M.</name>
</author>
<author>
<name>Strelchuk, V.V.</name>
</author>
<author>
<name>Nikolenko, A.S.</name>
</author>
<author>
<name>Stubrov, Yu.Yu.</name>
</author>
<author>
<name>Hirov, A.S.</name>
</author>
<author>
<name>Rusavsky, A.V.</name>
</author>
<author>
<name>Popov, V.P.</name>
</author>
<author>
<name>Lysenko, V.S.</name>
</author>
<id>http://dspace.nbuv.gov.ua:80/handle/123456789/117818</id>
<updated>2017-05-27T00:05:13Z</updated>
<published>2013-01-01T00:00:00Z</published>
<summary type="text">Graphene layers fabricated from the Ni/a-SiC bilayer precursor
Nazarov, A.N.; Vasin, A.V.; Gordienko, S.O.; Lytvyn, P.M.; Strelchuk, V.V.; Nikolenko, A.S.; Stubrov, Yu.Yu.; Hirov, A.S.; Rusavsky, A.V.; Popov, V.P.; Lysenko, V.S.
This paper considers a synthesis of graphene flakes on the Ni surface by&#13;
vacuum long and nitrogen rapid thermal treatment of the “sandwich” amorphous (a)&#13;
SiC/Ni multilayer deposited on silicon wafer by magnetron sputtering technique. The&#13;
lateral size of graphene flakes was estimated to be about hundreds of micrometers while&#13;
the thickness estimated using Raman scattering varied from one to few layers in case of&#13;
vacuum annealing. Rapid thermal annealing (RTA) in nitrogen ambient results in&#13;
formation of multilayer graphene with surface covering up to 80%. The graphene layers&#13;
synthesized on Ni during CVD process was used as reference samples. Atomic force&#13;
microscopy (AFM) is not able to detect graphene flakes in regime of surface topology&#13;
examination because of large roughness of Ni surface. Employment of scanning Kelvin&#13;
probe force microscopy (SKPFM) demonstrates correlation of the surface potential and&#13;
graphene flakes visible in optical microscopy. Using the KPFM method, potential&#13;
differences between Ni and graphene were determined.
</summary>
<dc:date>2013-01-01T00:00:00Z</dc:date>
</entry>
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