Ivashchenko, V.I.; Scrynskyy, P.L.; Lytvyn, O.S.; Butenko, O.O.; Sinelnichenko, O.K.; Gorb, L.; Hill, F.; Leszczynski, J.; Kozak, A.O.
(Сверхтвердые материалы, 2014)
NbN and Nb–Si–N films have been deposited by magnetron sputtering of the Nb and Si targets on silicon wafers at various powers supplied to the Nb target. The films have been investigated by an atomic force microscope, X-ray ...